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A review of the recent advances and developments in the practical application of amorphous chalcogenide materials is
presented, focusing special attention to holography and lithography. The main functional principles and practical
application of amorphous chalcogenide photoresists for production of the embossed rainbow holograms and holographic
optical elements are discussed. The laser interference lithography can be used as a low-cost method for the exposure of
large surfaces with regular patterns like subwavelength-gratings and microsieves. The surface-relief and reftactive-index
modulated gratings with a period of about 50 nm and less can be fabricated by immersion holographic method. The
Bragg reflection gratings were recorded and studied in amorphous As2S3 and As-S-Se films. The possibility to use the
amorphous chalcogenide films as a media for holographic recording and storage of information with high density is
discussed.
Janis Teteris
"Application of amorphous chalcogenide thin films
in optical recording technologies", Proc. SPIE 5946, Optical Materials and Applications, 59461K (13 June 2006); https://doi.org/10.1117/12.639333
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Janis Teteris, "Application of amorphous chalcogenide thin films in optical recording technologies," Proc. SPIE 5946, Optical Materials and Applications, 59461K (13 June 2006); https://doi.org/10.1117/12.639333