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Proceedings Article

Integrated Bragg gratings in silicon-on-insulator waveguides

Proc. SPIE 4640, Integrated Optics: Devices, Materials, and Technologies VI, 117 (June 18, 2002); doi:10.1117/12.433242
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From Conference Volume 4640

  • Integrated Optics: Devices, Materials, and Technologies VI
  • Yakov S. Sidorin; Ari Tervonen
  • San Jose, CA | January 18, 2002

abstract

In our work we have fabricated Bragg grating structures in silicon-on-insulator (SOI) waveguides. SOI waveguides enable integration of both passive and active functions, e.g. thermal, electrical or micromechanical tuning and optical receiving with the gratings. As silicon is a high refractive index material the first order grating period at 1550 nm wavelength is short, only 225 nm, and this period must be precisely controlled. Moreover, the grating must be spatially coherent over its entire length. All this introduces a great challenge for the fabrication techniques used to pattern the grating. Our approach to process gratings in SOI waveguides is based on direct e-beam writing and silicon etching with inductively coupled plasma (ICP). We show results on high aspect ratio Bragg gratings integrated with SOI waveguides with large core size.

© (2002) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Timo T. Aalto ; Sanna Yliniemi ; Paeivi Heimala ; Panu Pekko ; Janne Simonen, et al.
"Integrated Bragg gratings in silicon-on-insulator waveguides", Proc. SPIE 4640, Integrated Optics: Devices, Materials, and Technologies VI, 117 (June 18, 2002); doi:10.1117/12.433242; http://dx.doi.org/10.1117/12.433242


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