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Proceedings Article

Fabrication of silicon grisms

[+] Author Affiliations
Fabrizio Vitali, Dario Lorenzetti

Osservatorio Astronomico di Roma (Italy)

Elena Cianci, Vittorio Foglietti

Istituto di Elettronica dello Stato Solido (Italy)

Proc. SPIE 4842, Specialized Optical Developments in Astronomy, 274 (February 1, 2003); doi:10.1117/12.459460
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From Conference Volume 4842

  • Specialized Optical Developments in Astronomy
  • Eli Atad-Ettedgui; Sandro D'Odorico
  • Waikoloa, Hawai'i, United States | August 22, 2002

abstract

Silicon grisms are suitable optical devices that allow for a spectroscopic mode able to effectively complement the natural imaging mode of IR cameras, providing high spectral resolution (R>5000) in the near infrared. We present a review of the fabrication process aimed to produce IR grisms with high refractive index. Such devices are intended to implement a high resolution mode in the Near IR Camera-Spectrograph, NICS, the user instrument at the focal plane of the Italian national telescope Galileo. Litho masking and anisotropic etching techniques have been employed to get, firstly, silicon gratings of suitable size for astronomical use, then warm bonding techniques have been used to obtain the final grisms in echelle configuration. The results and the problems encountered in the bonding procedure are presented along with a future implementation of silicon grisms in space instrumentation.

© (2003) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Fabrizio Vitali ; Elena Cianci ; Vittorio Foglietti and Dario Lorenzetti
"Fabrication of silicon grisms", Proc. SPIE 4842, Specialized Optical Developments in Astronomy, 274 (February 1, 2003); doi:10.1117/12.459460; http://dx.doi.org/10.1117/12.459460


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