Novel fabrication technique of continuous profiles for microoptics and integrated optics

Thomas Käsebier; Holger Hartung; Ernst-Bernhard Kley; Andreas Tünnermann

doi:10.1117/12.625111

19 October 2005 Novel fabrication technique of continuous profiles for microoptics and integrated optics

Thomas Käsebier, Holger Hartung, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 5965, Optical Fabrication, Testing, and Metrology II; 596504 (2005) https://doi.org/10.1117/12.625111
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

We developed a fabrication process for microoptical elements with continuous profiles. In contrast to gray tone lithography with the cost intensive HEBS-glass or direct writing by laser or electron beam and the closely connected expensive equipment, the presented technique allows a low budget fabrication of continuous profiles with smooth surfaces. We use conventional binary photolithography with standard DNQ-Novolak based photoresist, simple smoothing techniques and proportional transfer by dry etching. All variations of the procedure are based on the local depth control with the local filling factor of a periodic pattern in a binary photomask. The filling factor of the mask defines the resist volume, which corresponds to an effective layer thickness. With the aid of smoothing techniques after development, the effective resist layer thickness is transformed to the real local profile thickness. Thus, continuous change of the filling factor in the periodic mask pattern results in a smooth height profile. Furthermore, it is possible to fabricate continuous height profiles with just one lithographic step if the mask pattern can not be resolved by the exposure-system. This can be achieved by the use of smaller periods or by increasing the gap between mask and substrate. The need of further surface smoothing depends on the smoothness demands. With the help of continuous resist profiles, fabricated by smoothing of binary resist patterns and also by using non-resolvable masks, combined with further binary structuring after the proportional transfer, three dimensional waveguide taper for low loss fiber-waveguide coupling via mode matching were successfully manufactured.

Citation Download Citation

Thomas Käsebier, Holger Hartung, Ernst-Bernhard Kley, and Andreas Tünnermann "Novel fabrication technique of continuous profiles for microoptics and integrated optics", Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 596504 (19 October 2005); https://doi.org/10.1117/12.625111

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
11 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Binary data

Photoresist materials

Waveguides

Lithography

Fabrication

Etching

Show All Keywords

Keywords/Phrases

Search In:

Publication Years