Feature shape variation using scatterometry

Patrick Schiavone; Vincent Farys; Andre Michallet

doi:10.1117/12.473454

16 July 2002 Feature shape variation using scatterometry

Patrick Schiavone, Vincent Farys, Andre Michallet

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473454
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

We have studied the ability of ellipsometric spectroscopy to determine slight feature shape variations. In this paper, we show that an optical technique can be a sensitive technique to detect slight profile variations, especially at the top of the features. Simulated results as well as experimental results are presented. A sensitivity metrics, that is better suited to ellipsometric measurements than the conventional mean square error, is proposed. It is used to quantify the sensitivity to measure the feature shape of interest and to examine preferable experimental set-up. Computer simulations and ellipsometry signal libraries have been generated using a common rigorous electromagnetic modal approach (MMFE, Modal Method by Fourier Expansion). Experimental verification has been performed on resist features fabricated using DUV lithography. The ability and sensitivity to measure overhanging profiles such as notched polysilicon gates that are impossible to measure using top-down SEM is also mentioned.

Citation Download Citation

Patrick Schiavone, Vincent Farys, and Andre Michallet "Feature shape variation using scatterometry", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473454

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