CW DUV light sources for inspection tools

Jun Sakuma; Yasuyuki Okada; Tetsumi Sumiyoshi; Hitoshi Sekita; Minoru Obara

doi:10.1117/12.632101

8 November 2005 CW DUV light sources for inspection tools

Jun Sakuma, Yasuyuki Okada, Tetsumi Sumiyoshi, Hitoshi Sekita, Minoru Obara

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 599243 (2005) https://doi.org/10.1117/12.632101
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

We describe true continuous-wave (CW), high-power, line-narrowed, deep-ultraviolet (DUV) light sources for the high-resolution metrology tools such as wafer inspection and mask inspection systems. The 198.5-nm CW radiation with 300-mW power has also been achieved by sum-frequency mixing (SFM) of 1064-nm output from a single-frequency Yb³⁺ fiber amplifier with the 244-nm radiation from a frequency-doubled argon-ion laser. The 266-nm CW DUV radiation with 5 W of maximum power has been generated by frequency doubling of 532-nm green laser output. Both sources utilize Brewster-cut CsLiB₆O₁₀ (CLBO) crystal for efficient and stable DUV light generation.

Citation Download Citation

Jun Sakuma, Yasuyuki Okada, Tetsumi Sumiyoshi, Hitoshi Sekita, and Minoru Obara "CW DUV light sources for inspection tools", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599243 (8 November 2005); https://doi.org/10.1117/12.632101

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