Paper
17 April 2001 Growth of PLD Hg1-xCdxTe films on Si-patterned substrates
Marian Kuzma, Grzegorz Wisz, Tamara Ya. Gorbach, Petr S. Smertenko, Sergey V. Svechnikov, Ryszard Ciach, Jerzy Morgiel, Anna Rakowska
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Abstract
The growth of Hg1-xCdxTe layers obtained by pulse deposition technique on planar and non-planar patterned Si substrates with the tetragonal pyramids and the hemispherical plates was investigated by SEM, TEM spectroscopy, X-ray diffraction, X-ray analysis and I-V characterization. The effects of the Si substrate type, feature of the substrate patterns, substrate temperature, laser shots number on morphological stability of films, growth mode, films crystallinity and charge transport mechanisms on both Hg1- xCdxTe/Si interface and on Hg1-xCdxTe surface were discussed. The PLD growth of Hg1-xCdxTe films on Si substrates has been optimized both to the formation of stoichiometric films (x=0.2) and to the preparation of x-variable films.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marian Kuzma, Grzegorz Wisz, Tamara Ya. Gorbach, Petr S. Smertenko, Sergey V. Svechnikov, Ryszard Ciach, Jerzy Morgiel, and Anna Rakowska "Growth of PLD Hg1-xCdxTe films on Si-patterned substrates", Proc. SPIE 4413, International Conference on Solid State Crystals 2000: Epilayers and Heterostructures in Optoelectronics and Semiconductor Technology, (17 April 2001); https://doi.org/10.1117/12.425403
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KEYWORDS
Silicon

Mercury cadmium telluride

Silicon films

Mercury

Temperature metrology

Thin films

Crystals

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