Stress analysis of silica-based arrayed waveguide grating by a finite element method

Xiaoqing Deng; Qingqing Yang; Hongjie Wang; Xiongwei Hu; Qiming Wang

doi:10.1117/12.483113

17 September 2002 Stress analysis of silica-based arrayed waveguide grating by a finite element method

Xiaoqing Deng, Qingqing Yang, Hongjie Wang, Xiongwei Hu, Qiming Wang

Proceedings Volume 4918, Materials, Devices, and Systems for Display and Lighting; (2002) https://doi.org/10.1117/12.483113
Event: Photonics Asia, 2002, Shanghai, China

Abstract

The stress distribution in silica optical waveguides on silicon is calculated by using finite element method (FEM). The waveguides are mainly subjected to compressive stress along the x direction and the z direction, and it is accumulated near the interfaces between the core and cladding layers. The shift of central wavelegnth of silica arrayed waveguide grating on silicon-substrate with the designed wavelength and the polarization dependence are caused by the stress in the silica waveguides.

Citation Download Citation

Xiaoqing Deng, Qingqing Yang, Hongjie Wang, Xiongwei Hu, and Qiming Wang "Stress analysis of silica-based arrayed waveguide grating by a finite element method", Proc. SPIE 4918, Materials, Devices, and Systems for Display and Lighting, (17 September 2002); https://doi.org/10.1117/12.483113

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