Electrodischarge VUV radiator of low pressure on the mixtures He(Ar, Kr, Xe)/H2O

Alexandr K. Shuaibov; Ludwig L. Shimon; Arkadij Dashchenko; Igor Shevera

doi:10.1117/12.460153

26 March 2002 Electrodischarge VUV radiator of low pressure on the mixtures He(Ar, Kr, Xe)/H₂O

Alexandr K. Shuaibov, Ludwig L. Shimon, Arkadij Dashchenko, Igor Shevera

Proceedings Volume 4747, International Conference on Atomic and Molecular Pulsed Lasers IV; (2002) https://doi.org/10.1117/12.460153
Event: International Conference on Atomic and Molecular Pulsed Lasers IV, 2001, Tomsk, Russian Federation

Abstract

The results of development and optimization of the working medium of ecological pure radiator working in the range of 130 - 190 nm are presented in this paper. A decaying discharge of a constant current in the quartz or sapphire tube with an interelectrode distance of 50 mm was used for pumping. As working media the mixtures He(Ar, Kr, Xe)/H₂O were used. It was shown that by falling the pressure on discharge interval U_chequals 800 - 1700 V, in discharge current I_ch equals 5 - 50 mA and partial pressure of water vapor P(H₂O)

Citation Download Citation

Alexandr K. Shuaibov, Ludwig L. Shimon, Arkadij Dashchenko, and Igor Shevera "Electrodischarge VUV radiator of low pressure on the mixtures He(Ar, Kr, Xe)/H₂O", Proc. SPIE 4747, International Conference on Atomic and Molecular Pulsed Lasers IV, (26 March 2002); https://doi.org/10.1117/12.460153

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