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Proceedings Article

Fabrication of aspherical microlenses in fused silica and silicon

[+] Author Affiliations
Reinhard Voelkel, Martin Eisner

Karl Suss KG Neuchatel (Switzerland)

Kenneth J. Weible

Weible OpTech (Switzerland)

Proc. SPIE 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication, 40 (November 9, 2001); doi:10.1117/12.448056
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From Conference Volume 4440

  • Lithographic and Micromachining Techniques for Optical Component Fabrication
  • Ernst-Bernhard Kley; Hans Peter Herzig
  • San Diego, CA, USA | July 29, 2001

abstract

We report on the fabrication of aspherical refractive microlens arrays on 8'' fused silica and silicon wafers at Suss Neuchatel, Switzerland. Refractive, plano-convex microlenses are fabricated by using photolithography, a reflow or melting resist technique and reactive ion etching. Diffraction-limited optical performance of the microlenses is achieved for refractive microlenses from 100 microns to 1.5 mm diameter and 2 to 50 microns sag. Aspherical lens profiles (aspherical constant from k equals -0.5 to -5.2) are obtained by varying the etch parameters during the reactive ion etching transfer. Microlens arrays in fused silica and silicon are fabricated for high-efficient fiber coupling and telecommunication. Densely packed arrays of cylindrical lenses (packing density > 98%, parabolic profile) are fabricated for flattop illumination at UV-wavelengths. Excellent array uniformity of is required for microlenses used within Microlens Projection Lithography systems.

© (2001) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Reinhard Voelkel ; Martin Eisner and Kenneth J. Weible
"Fabrication of aspherical microlenses in fused silica and silicon", Proc. SPIE 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication, 40 (November 9, 2001); doi:10.1117/12.448056; http://dx.doi.org/10.1117/12.448056


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