Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Precision optical asphere fabrication by plasma jet chemical etching (PJCE) and ion beam figuring

[+] Author Affiliations
Axel Schindler, Thomas Haensel, Wilfried Frank, Andreas Nickel, Bernd Rauschenbach, Frieder Bigl

Institute for Surface Modification (Germany)

Georg Boehm

JENOPTIK Laser, Optik, Systeme GmbH (Germany)

Proc. SPIE 4451, Optical Manufacturing and Testing IV, 242 (December 27, 2001); doi:10.1117/12.453622
Text Size: A A A
From Conference Volume 4451

  • Optical Manufacturing and Testing IV
  • H. Philip Stahl
  • San Diego, CA, USA | July 29, 2001

abstract

We develop a Plasma Jet Chemical Etching (PJCE) technique for high rate precision machining of optical materials aiming in a technology mature for precision asphere and free-form surface topology fabrication. The present contribution summarizes the achievements after about twelve months experience with a prototype production tool facility. PJCE is performed with the help of a microwave driven reactive plasma-jet working in a broad pressure range (10-600 mbar). We developed a moveable lightweight microwave plasma jet source for dwell time techniques performed in a roughly pumped process chamber equipped with a six axis system for precision workpiece and plasma source movement. Volume etch rates of some 10 mm3/min have been achieved for fused silica and silicon, respectively, using reactive (CF4,SF6,O2) and inert (Ar,He) gas mixtures and applying a microwave (2.45 GHz) power in the 100-200 W range. Large quartz plates (80-160 mm) have been figured using dwell time methods to achieve aspheric deformations of some 10 micrometers . The figured surfaces show shape errors of 1-2 micrometers and a microroughness of 50-100 nm RMS but no sub-surface damage enabling a small tool shape conserving post polishing up to the sub-nanometer roughness level. Thus, surface shaping to the nanometer error range can be done by ion beam finishing.

© (2001) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Axel Schindler ; Georg Boehm ; Thomas Haensel ; Wilfried Frank ; Andreas Nickel, et al.
"Precision optical asphere fabrication by plasma jet chemical etching (PJCE) and ion beam figuring", Proc. SPIE 4451, Optical Manufacturing and Testing IV, 242 (December 27, 2001); doi:10.1117/12.453622; http://dx.doi.org/10.1117/12.453622


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.