Surface and interface roughness in magnetic thin films: a comparison using carbon-nanotube atomic force microscopy and soft-x-ray scattering

Bryan M. Barnes; F. Flack; John J. Kelly IV; Doug P. Lagally; Don E. Savage; Max G. Lagally

doi:10.1117/12.453790

22 October 2002 Surface and interface roughness in magnetic thin films: a comparison using carbon-nanotube atomic force microscopy and soft-x-ray scattering

Bryan M. Barnes, F. Flack, John J. Kelly IV, Doug P. Lagally, Don E. Savage, Max G. Lagally

Author Affiliations +

Proceedings Volume 4780, Surface Scattering and Diffraction for Advanced Metrology II; (2002) https://doi.org/10.1117/12.453790
Event: International Symposium on Optical Science and Technology, 2002, Seattle, WA, United States

Abstract

Characterization of surface and interfacial morphology of magnetic materials is crucial to understand their properties. While AFM is unparalleled in directly determining surface morphology, x-ray scattering has distinct advantages for measuring both the surface and buried interfaces. However, x-ray scattering (XRS) requires modeling to extract roughness parameters. We review the techniques for performing and modeling XRS and show that the azimuthal transverse scattering geometry offers many advantages to in-plane scattering techniques, including a simplified modeling process and an extended scanning range in reciprocal space. To validate our modeling, the surface morphology of several magnetic thin films (d < 10 nm) is characterized using soft-x-ray scattering and carbon-nanotube tip atomic force microscopy (CNT-AFM). Results for out-of-plane XRS and CNT-AFM are within good quantitative agreement within their shared experimental bandpass.

Citation Download Citation

Bryan M. Barnes, F. Flack, John J. Kelly IV, Doug P. Lagally, Don E. Savage, and Max G. Lagally "Surface and interface roughness in magnetic thin films: a comparison using carbon-nanotube atomic force microscopy and soft-x-ray scattering", Proc. SPIE 4780, Surface Scattering and Diffraction for Advanced Metrology II, (22 October 2002); https://doi.org/10.1117/12.453790

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available