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Proceedings Article

New silica glass (AQF) for 157-nm lithography

[+] Author Affiliations
Yoshiaki Ikuta, Shinya Kikugawa, T. Kawahara, H. Mishiro, Noriaki Shimodaira, Shuhei Yoshizawa

Asahi Glass Co., Ltd. (Japan)

Proc. SPIE 4000, Optical Microlithography XIII, 1510 (July 5, 2000); doi:10.1117/12.388990
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From Conference Volume 4000

  • Optical Microlithography XIII
  • Christopher J. Progler
  • Santa Clara, CA | February 27, 2000

abstract

Projection photolithography at 157 nm is now under research as a possible extension of current 248 nm and planned 193 nm technologies. We have succeeded in the development of the modified fused silica glass 'AQF' for 157 nm lithography. In this paper, we present the performance of the newest material; AQF/Ver. 2.1. Transmission and its uniformity at 157 nm is better than 78 +/- 1.5 percent, and birefringence is within 2nm. The surface flatness is less than 0.5 micrometers , and surface defects over 0.4 micrometers in size are free.

© (2000) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Yoshiaki Ikuta ; Shinya Kikugawa ; T. Kawahara ; H. Mishiro ; Noriaki Shimodaira, et al.
"New silica glass (AQF) for 157-nm lithography", Proc. SPIE 4000, Optical Microlithography XIII, 1510 (July 5, 2000); doi:10.1117/12.388990; http://dx.doi.org/10.1117/12.388990


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