High-repetition-rate fluorine laser for microlithography

Junichi Fujimoto; Shinji Nagai; Koji Shio; Yasuaki Iwata; Kiwamu Takehisa; Toshihiro Nishisaka; Osamu Wakabayashi; Hakaru Mizoguchi

doi:10.1117/12.388997

5 July 2000 High-repetition-rate fluorine laser for microlithography

Junichi Fujimoto, Shinji Nagai, Koji Shio, Yasuaki Iwata, Kiwamu Takehisa, Toshihiro Nishisaka, Osamu Wakabayashi, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388997
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The fluorine molecular laser is a very promising light source for the next generation of optical microlithography below 100 nm. The fluorine laser we developed uses a new, all solid-state pulse power module, that generates an output energy of 6 J/pulse, and an optimized RF pre-ionization. At 2000Hz, 11 mJ/pulse have been measured. Single line oscillation at 157.6299nm was obtained using prisms. Fluorine laser spectra have been measured with a high- resolution VUV spectrometer. The convoluted bandwidth was 1.08pm for 0.1 percent /balance F₂/He and a total pressure of 3000 hPa. Currently, we are investigating Ultra Narrow fluorine lasers with a bandwidth below 0.2pm. This laser is aimed for exposure tools using refractive projection optics at 157nm. Evaluation tools for optical materials and coatings have also been developed. The temporal transmittance during 157 nm laser irradiation and the transmittance between the DUV and VUV region directly after laser irradiation can be measured. We have successfully demonstrated the potential of the molecular fluorine laser for microlithography and a first generation laser for 157 nm exposure tools is almost ready.

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Junichi Fujimoto, Shinji Nagai, Koji Shio, Yasuaki Iwata, Kiwamu Takehisa, Toshihiro Nishisaka, Osamu Wakabayashi, and Hakaru Mizoguchi "High-repetition-rate fluorine laser for microlithography", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388997

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