Inspection of production alternating PSM reticles using UV-based 365-nm reticle inspection tool

Anja Rosenbusch; Michael M. Har-zvi; Gidon Gottlib

doi:10.1117/12.458284

11 March 2002 Inspection of production alternating PSM reticles using UV-based 365-nm reticle inspection tool

Anja Rosenbusch, Michael M. Har-zvi, Gidon Gottlib

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458284
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

The paper presents results of a thorough study using the UV-based die-to-database mask inspection system ARIS^TM100i for the inspection of alternating phase shifting masks (AAPSM) designed for ArF (193nm) technology. Specially designed test masks were used to investigate sensitivity limitations of the i-line tool. Main focus is on phase errors, which were treated as a function of defect size, phase, and mask location. In addition, production reticles were inspected using a specially developed sensitivity AAPSM. Production issues like false defect rate and data preparation were addressed. The paper is concluded with a short printability analysis of different phase defects detected during the experiment.

Citation Download Citation

Anja Rosenbusch, Michael M. Har-zvi, and Gidon Gottlib "Inspection of production alternating PSM reticles using UV-based 365-nm reticle inspection tool", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458284

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