Paper
29 June 2001 Plume formation and optical breakdown on KrF excimer laser-irradiated silica glass
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Abstract
We report the onset of plume formation and optical breakdown in a synthetic silica glass under KrF excimer laser irradiation by luminescence spectroscopy and imaging. With increasing laser fluence, bright, highly localized luminescence due to plume formation appears on the luminescence image, and sharp lines due to Si atom fluorescence appear in the 200-300 nm region on the luminescence spectra. The SEM images on the laser-damaged region show typically two structures: (1) many small holes of the order of 1 micrometer suggesting localized vaporization, and (2) large craters of 10-100 micrometers due to spallation. The large craters have irregular shapes consistent with fracture often seen in amorphous materials.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yoshizo Kawaguchi, Steve C. Langford, and J. Thomas Dickinson "Plume formation and optical breakdown on KrF excimer laser-irradiated silica glass", Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); https://doi.org/10.1117/12.432517
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Cited by 2 scholarly publications.
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KEYWORDS
Luminescence

Silica

Glasses

Scanning electron microscopy

Ultraviolet radiation

Absorption

Silicon

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