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Proceedings Article

New modified silica glass for 157-nm lithography

[+] Author Affiliations
Yoshiaki Ikuta, Shinya Kikugawa, T. Kawahara, H. Mishiro, Kaname Okada, Katsuhiro Ochiai, Keigo Hino, T. Nakajima, M. Kawata, Shuhei Yoshizawa

Asahi Glass Co., Ltd. (Japan)

Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, 564 (July 19, 2000); doi:10.1117/12.392092
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From Conference Volume 4066

  • Photomask and Next-Generation Lithography Mask Technology VII
  • Hiroaki Morimoto
  • Kanagawa, Japan | April 12, 2000

abstract

Projection photolithography at 157 nm is now under research as a possible extension of current 248 and planned 193 nm technologies. We have succeeded in the development of the modified fused silica glass 'AQF' for 157 nm lithography. In this paper, we present the performance of the newest material; AQF/Ver.2.1. Transmission and its uniformity at 157 nm is better than 78 +/- 1.5 percent, and birefringence is within 2 nm. We also have developed hard pellicle with 300 micrometers thickness. Its transmission is over 92 percent when AR films are coated on both surfaces. This hard pellicle also has a very good durability to F2 laser.

© (2000) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Yoshiaki Ikuta ; Shinya Kikugawa ; T. Kawahara ; H. Mishiro ; Kaname Okada, et al.
"New modified silica glass for 157-nm lithography", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, 564 (July 19, 2000); doi:10.1117/12.392092; http://dx.doi.org/10.1117/12.392092


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