System integration and performance of the EUV engineering test stand

Daniel A. Tichenor; Avijit K. Ray-Chaudhuri; William C. Replogle; Richard H. Stulen; Glenn D. Kubiak; Paul D. Rockett; Leonard E. Klebanoff; Karen J. Jefferson; Alvin H. Leung; John B. Wronosky; Layton C. Hale; Henry N. Chapman; John S. Taylor; James A. Folta; Claude Montcalm; Regina Soufli; Eberhard Adolf Spiller; Kenneth L. Blaedel; Gary E. Sommargren; Donald W. Sweeney; Patrick P. Naulleau; Kenneth A. Goldberg; Eric M. Gullikson; Jeffrey Bokor; Phillip J. Batson; David T. Attwood Jr.; Keith H. Jackson; Scott Daniel Hector; Charles W. Gwyn; Pei-yang Yan

doi:10.1117/12.436665

20 August 2001 System integration and performance of the EUV engineering test stand

Daniel A. Tichenor, Avijit K. Ray-Chaudhuri, William C. Replogle, Richard H. Stulen, Glenn D. Kubiak, Paul D. Rockett, Leonard E. Klebanoff, Karen J. Jefferson, Alvin H. Leung, John B. Wronosky, Layton C. Hale, Henry N. Chapman, John S. Taylor, James A. Folta, Claude Montcalm, Regina Soufli, Eberhard Adolf Spiller, Kenneth L. Blaedel, Gary E. Sommargren, Donald W. Sweeney, Patrick P. Naulleau, Kenneth A. Goldberg, Eric M. Gullikson, Jeffrey Bokor, Phillip J. Batson, David T. Attwood Jr., Keith H. Jackson, Scott Daniel Hector, Charles W. Gwyn, Pei-yang Yan

Author Affiliations +

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436665
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

The Engineering Test Stand (ETS) is a developmental lithography tool designed to demonstrate full-field EUV imaging and provide data for commercial-tool development. In the first phase of integration, currently in progress, the ETS is configured using a developmental projection system, while fabrication of an improved projection system proceeds in parallel. The optics in the second projection system have been fabricated to tighter specifications for improved resolution and reduced flare. The projection system is a 4-mirror, 4x-reduction, ring-field design having a numeral aperture of 0.1, which supports 70 nm resolution at a k₁ of 0.52. The illuminator produces 13.4 nm radiation from a laser-produced plasma, directs the radiation onto an arc-shaped field of view, and provides an effective fill factor at the pupil plane of 0.7. The ETS is designed for full-field images in step-and-scan mode using vacuum-compatible, magnetically levitated, scanning stages. This paper describes system performance observed during the first phase of integration, including static resist images of 100 nm isolated and dense features.

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Daniel A. Tichenor, Avijit K. Ray-Chaudhuri, William C. Replogle, Richard H. Stulen, Glenn D. Kubiak, Paul D. Rockett, Leonard E. Klebanoff, Karen J. Jefferson, Alvin H. Leung, John B. Wronosky, Layton C. Hale, Henry N. Chapman, John S. Taylor, James A. Folta, Claude Montcalm, Regina Soufli, Eberhard Adolf Spiller, Kenneth L. Blaedel, Gary E. Sommargren, Donald W. Sweeney, Patrick P. Naulleau, Kenneth A. Goldberg, Eric M. Gullikson, Jeffrey Bokor, Phillip J. Batson, David T. Attwood Jr., Keith H. Jackson, Scott Daniel Hector, Charles W. Gwyn, and Pei-yang Yan "System integration and performance of the EUV engineering test stand", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436665

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