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Proceedings Article

System integration and performance of the EUV engineering test stand

[+] Author Affiliations
Daniel A. Tichenor, Avijit K. Ray-Chaudhuri, William C. Replogle, Richard H. Stulen, Glenn D. Kubiak, Paul D. Rockett, Leonard E. Klebanoff, Karen J. Jefferson, Alvin H. Leung, John B. Wronosky

Sandia National Labs. (USA)

Layton C. Hale, Henry N. Chapman, John S. Taylor, James A. Folta, Claude Montcalm, Regina Soufli, Eberhard A. Spiller, Kenneth L. Blaedel, Gary E. Sommargren, Donald W. Sweeney

Lawrence Livermore National Lab. (USA)

Patrick P. Naulleau, Kenneth A. Goldberg, Eric M. Gullikson, Jeffrey Bokor, Phillip J. Batson, David T. Attwood, Jr., Keith H. Jackson

Lawrence Berkeley National Lab. (USA)

Scott D. Hector

Motorola (USA)

Charles W. Gwyn, Pei-yang Yan

Intel Corp. (USA)

Proc. SPIE 4343, Emerging Lithographic Technologies V, 19 (August 20, 2001); doi:10.1117/12.436665
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From Conference Volume 4343

  • Emerging Lithographic Technologies V
  • Elizabeth A. Dobisz
  • Santa Clara, CA | February 25, 2001

abstract

The Engineering Test Stand (ETS) is a developmental lithography tool designed to demonstrate full-field EUV imaging and provide data for commercial-tool development. In the first phase of integration, currently in progress, the ETS is configured using a developmental projection system, while fabrication of an improved projection system proceeds in parallel. The optics in the second projection system have been fabricated to tighter specifications for improved resolution and reduced flare. The projection system is a 4-mirror, 4x-reduction, ring-field design having a numeral aperture of 0.1, which supports 70 nm resolution at a k1 of 0.52. The illuminator produces 13.4 nm radiation from a laser-produced plasma, directs the radiation onto an arc-shaped field of view, and provides an effective fill factor at the pupil plane of 0.7. The ETS is designed for full-field images in step-and-scan mode using vacuum-compatible, magnetically levitated, scanning stages. This paper describes system performance observed during the first phase of integration, including static resist images of 100 nm isolated and dense features.

© (2001) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Daniel A. Tichenor ; Avijit K. Ray-Chaudhuri ; William C. Replogle ; Richard H. Stulen ; Glenn D. Kubiak, et al.
"System integration and performance of the EUV engineering test stand", Proc. SPIE 4343, Emerging Lithographic Technologies V, 19 (August 20, 2001); doi:10.1117/12.436665; http://dx.doi.org/10.1117/12.436665


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