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Proceedings Article

Progress of the EUVL alpha tool

[+] Author Affiliations
Hans Meiling, Jos P. Benschop

ASML B.V. (Netherlands)

Udo Dinger, Peter Kuerz

Carl Zeiss (Germany)

Proc. SPIE 4343, Emerging Lithographic Technologies V, 38 (August 20, 2001); doi:10.1117/12.436675
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From Conference Volume 4343

  • Emerging Lithographic Technologies V
  • Elizabeth A. Dobisz
  • Santa Clara, CA | February 25, 2001

abstract

After the successful completion of the European program EUCLIDES in which core competence for Extreme UltraViolet Lithography (EUVL) technology was generated, ASML (system integration), Carl Zeiss (optics), and their partners have entered the next phase of the program: design and realization of an exposure tool called the alpha tool ((alpha) -tool). This tool should be completed in 2003, and will demonstrate 50-nm-node compliant imaging using full- field all-reflective four-times reducing optics, as well as high performance vacuum scanning wafer- and reticle stages. IN this paper we present the status of the project, as well as highlight the progress in the optics development and optics contamination mitigation efforts.

© (2001) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Hans Meiling ; Jos P. Benschop ; Udo Dinger and Peter Kuerz
"Progress of the EUVL alpha tool", Proc. SPIE 4343, Emerging Lithographic Technologies V, 38 (August 20, 2001); doi:10.1117/12.436675; http://dx.doi.org/10.1117/12.436675


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