Automated search method for AFM and profilers

Michael Ray; Yves C. Martin

doi:10.1117/12.436729

22 August 2001 Automated search method for AFM and profilers

Michael Ray, Yves C. Martin

Proceedings Volume 4344, Metrology, Inspection, and Process Control for Microlithography XV; (2001) https://doi.org/10.1117/12.436729
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

A new automation software creates a search model as an initial setup and searches for a user-defined target in atomic force microscopes or stylus profilometers used in semiconductor manufacturing. The need for such automation has become critical in manufacturing lines. The new method starts with a survey map of a small area of a chip obtained from a chip-design database or an image of the area. The user interface requires a user to point to and define a precise location to be measured, and to select a macro function for an application such as line width or contact hole. The search algorithm automatically constructs a range of possible scan sequences within the survey, and provides increased speed and functionality compared to the methods used in instruments to date. Each sequence consists in a starting point relative to the target, a scan direction, and a scan length. The search algorithm stops when the location of a target is found and criteria for certainty in positioning is met. With today's capability in high speed processing and signal control, the tool can simultaneously scan and search for a target in a robotic and continuous manner. Examples are given that illustrate the key concepts.

Citation Download Citation

Michael Ray and Yves C. Martin "Automated search method for AFM and profilers", Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); https://doi.org/10.1117/12.436729

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