Thin carbon nitride films for integrated optical chemical sensors

Ivan Huettel; Frantisek Cerny; Jan Gurovic; Miroslav Chomat; Vlastimil Matejec

doi:10.1117/12.372919

15 December 1999 Thin carbon nitride films for integrated optical chemical sensors

Ivan Huettel, Frantisek Cerny, Jan Gurovic, Miroslav Chomat, Vlastimil Matejec

Proceedings Volume 3858, Advanced Materials and Optical Systems for Chemical and Biological Detection; (1999) https://doi.org/10.1117/12.372919
Event: Photonics East '99, 1999, Boston, MA, United States

Abstract

Thin carbon or carbon nitride films exhibit specific optical and mechanical properties which make them promising materials for integrated optical sensors. Carbon and carbon nitride thin films were prepared by the Plasma Enhanced Chemical Vapor Deposition (PECVD) method. The substrates were prepared in shapes and sizes suitable for the planned measurements. The surfaces for film deposition were polished and the substrates were cleaned in organic solvents by means of ultrasound before treatment. The following film properties were investigated: the thickness, internal stress, dependence of the friction coefficient on load, refractive index, waveguide properties and composition. The most interesting feature of these films is a change of their refractive index under the influence of the surrounding gaseous environment. Carbon nitride films were prepared in a PECVD apparatus in an arrangement with planar plate electrodes through the decomposition of methane in argon atmosphere. CN_x films were prepared by the reaction of methane and nitrogen or methane and ammonia. It has been found that optical and mechanical properties of the films prepared on the positive and negative electrodes are greatly different. The films deposited on the negative electrode were harder and their refractive index was higher than those deposited on the negative electrode. The refractive index of the harder films ranged from 2.2 to 2.6 while for the softer films is ranged from 1.6 to 1.8. Using ellipsometry it has also been found that the refractive index of the films prepared on the positive electrode did not change under the atmosphere of H₂. On the other hand, the refractive index of the films deposited on the negative electrode and measured under the same conditions changed by about 3 - 5%.

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Ivan Huettel, Frantisek Cerny, Jan Gurovic, Miroslav Chomat, and Vlastimil Matejec "Thin carbon nitride films for integrated optical chemical sensors", Proc. SPIE 3858, Advanced Materials and Optical Systems for Chemical and Biological Detection, (15 December 1999); https://doi.org/10.1117/12.372919

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KEYWORDS

Carbon

Refractive index

Electrodes

Waveguides

Silicon

Integrated optics

Plasma enhanced chemical vapor deposition

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