Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Topography effects and wave aberrations in advanced PSM technology

[+] Author Affiliations
Andreas Erdmann

Fraunhofer Institute for Integrated Circuits (Germany)

Proc. SPIE 4346, Optical Microlithography XIV, 345 (September 14, 2001); doi:10.1117/12.435734
Text Size: A A A
From Conference Volume 4346

  • Optical Microlithography XIV
  • Christopher J. Progler
  • Santa Clara, CA | February 25, 2001

abstract

Both mask design and quality of the projection optics have a large impact on the performance of a phase shift mask (PSM). Topographic features on the reticle such as etched trenches in alternating PSM produce a spectrum of the diffracted light which differs from that one of an infinitely thin amplitude/phase object, as it is assumed in standard imaging algorithms. Many authors have investigated the consequences of this phenomenon with respect to aberration free imaging. However, the diffraction of light from topographic features implies also a modified interaction between the mask and wave aberrations of the projector. Rigorous simulation of the light diffraction from the mask is combined with standard lithography imaging algorithms to explore the interaction of topography effects and wave aberrations. For example, the nominal shift of a phase edge in the final resist profile can result both from topography effects and/or from odd-order wave aberrations such as tilt and coma. The sensitivity of typical lithographic parameters with respect to topography parameters and typical wave aberrations is investigated. PSM are also used for the monitoring of aberrations. Neglecting the topography of these phase objects may result in a misinterpretation of aberration phenomena. Consequences of rigorous diffraction defects for the design and interpretation of phase objects in aberration monitors will be discussed.

© (2001) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Andreas Erdmann
"Topography effects and wave aberrations in advanced PSM technology", Proc. SPIE 4346, Optical Microlithography XIV, 345 (September 14, 2001); doi:10.1117/12.435734; http://dx.doi.org/10.1117/12.435734


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.