Optical thin films grown by surface chemical reaction for high-power lasers

Shin-ichi Zaitsu; Shinji Motokoshi; Takahisa Jitsuno; Masahiro Nakatsuka; Tatsuhiko Yamanaka

doi:10.1117/12.425045

12 April 2001 Optical thin films grown by surface chemical reaction for high-power lasers

Shin-ichi Zaitsu, Shinji Motokoshi, Takahisa Jitsuno, Masahiro Nakatsuka, Tatsuhiko Yamanaka

Proceedings Volume 4347, Laser-Induced Damage in Optical Materials: 2000; (2001) https://doi.org/10.1117/12.425045
Event: Laser-Induced Damage in Optical Materials: 2000, 2000, Boulder, CO, United States

Abstract

We developed a novel coating method using chemical reactions of gaseous reactants on a surface. A self-limiting nature of surface chemical reactions allows precisely controlled growth of films with high uniformity and controllability of thickness over large area. The nonuniformity of thickness distribution was under 1% over 240 mm in diameter. The film thickness had proportional relationship with a number of chemical reactions. TiO₂ films at growth temperature of 25 degree(s)C had a laser-induced damage threshold of 5 J/cm² for 1-ns, 1.06-micrometers laser pulses. The laser damage resistance of TiO₂ films decreased at higher growth temperature. TiO₂ films grown at the high temperature had higher crystallinity. We clarified that the laser damages resulted from the local sites that absorbed the laser energy.

Citation Download Citation

Shin-ichi Zaitsu, Shinji Motokoshi, Takahisa Jitsuno, Masahiro Nakatsuka, and Tatsuhiko Yamanaka "Optical thin films grown by surface chemical reaction for high-power lasers", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); https://doi.org/10.1117/12.425045

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