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Proceedings Article

Laser raster conditioning of KDP and DKDP crystals using XeCl and Nd:YAG lasers

[+] Author Affiliations
Michael C. Staggs, Ming Yan, Michael J. Runkel

Lawrence Livermore National Lab. (USA)

Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, 400 (April 12, 2001); doi:10.1117/12.425050
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From Conference Volume 4347

  • Laser-Induced Damage in Optical Materials: 2000
  • Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau
  • Boulder, CO | October 16, 2000

abstract

Laser conditioning by raster scanning DKP and DKDP crystals using Nd:YAG and XeCl excimer laser systems was demonstrated. The laser systems were evaluated to determine their respective feasibility of improving the damage thresholds of the harmonic materials for use on the National Ignition Facility (NIF). Crystals were first evaluated using an Nd:YAG laser (355 nm, 7.6 ns) by scanning 2 x 2 cm2 areas with sub-damage threshold fluences and then performing unconditioned (S/1) damage tests at 355-nm in the respectively scanned regions. Subsequently, five KDP and DKDP samples of various damage quality were raster scanned in a similar fashion at MicroLas GmbH (Goettingen, Germany) using a commercial Lambda Physik Excimer system (XeCl, (lambda) equals 308 nm, 20 ns). The samples treated in Germany were then tested at Livermore National Laboratory (LLNL) at 355 nm to demonstrate the excimer's potential as an alternative conditioning source.

© (2001) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Michael C. Staggs ; Ming Yan and Michael J. Runkel
"Laser raster conditioning of KDP and DKDP crystals using XeCl and Nd:YAG lasers", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, 400 (April 12, 2001); doi:10.1117/12.425050; http://dx.doi.org/10.1117/12.425050


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