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Proceedings Article

Stereolithography with XeCl excimer laser/lamp

[+] Author Affiliations
Saburoh Satoh, Takao Tanaka, Satoshi Ihara, Chobei Yamabe

Saga Univ. (Japan)

Proc. SPIE 3888, High-Power Lasers in Manufacturing, 264 (February 7, 2000); doi:10.1117/12.377028
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From Conference Volume 3888

  • High-Power Lasers in Manufacturing
  • Xiangli Chen; Tomoo Fujioka; Akira Matsunawa
  • Osaka, Japan | November 01, 1999

abstract

For the stereo-lithography, XeCl excimer laser has been adapted to improve the utilization efficiency of laser energy. Because of the beam uniformity was made better by a homogenizer, the quantity of cured resin per laser energy was increased compare than that without the homogenizer. With this method a simple 3D object was created, and its was proved that XeCl excimer laser was possible to apply for the stereo- lithography.

© (2000) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Saburoh Satoh ; Takao Tanaka ; Satoshi Ihara and Chobei Yamabe
"Stereolithography with XeCl excimer laser/lamp", Proc. SPIE 3888, High-Power Lasers in Manufacturing, 264 (February 7, 2000); doi:10.1117/12.377028; http://dx.doi.org/10.1117/12.377028


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