Optical properties and laser damage of thin films deposited by reactive rf-magnetron sputtering

Kunio Yoshida; Noriaki Tochio; M. Ohya; Kanyoshi Ochi; Schukichi Kaku; Tomosumi Kamimura; Hidetsugu Yoshida

doi:10.1117/12.380866

3 April 2000 Optical properties and laser damage of thin films deposited by reactive rf-magnetron sputtering

Kunio Yoshida, Noriaki Tochio, M. Ohya, Kanyoshi Ochi, Schukichi Kaku, Tomosumi Kamimura, Hidetsugu Yoshida

Proceedings Volume 3889, Advanced High-Power Lasers; (2000) https://doi.org/10.1117/12.380866
Event: Advanced High-Power Lasers and Applications, 1999, Osaka, Japan

Abstract

The development of high power lasers requires highly damage- resistant optical coatings. Present multilayer dielectric coatings do not have sufficient laser-induced damage thresholds (LIDTs) to pulsed lasers, particularly in the short wavelength region. The LIDT strongly depends on the absorption coefficient of optical coatings and the absorbing contaminants on the optical substrate. The absorption of optical coatings can be minimized by optimizing the deposition condition. However, polishing compound embedded inside subsurface among the absorbing contaminants cannot be completely removed by standard optical cleaning techniques. In this paper, the significant improvement of LIDT of optical coatings on subsurface-damage removed fused silica glass due to ion etching is presented.

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Kunio Yoshida, Noriaki Tochio, M. Ohya, Kanyoshi Ochi, Schukichi Kaku, Tomosumi Kamimura, and Hidetsugu Yoshida "Optical properties and laser damage of thin films deposited by reactive rf-magnetron sputtering", Proc. SPIE 3889, Advanced High-Power Lasers, (3 April 2000); https://doi.org/10.1117/12.380866

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