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Proceedings Article

Properties of fluoride DUV excimer laser optics: influence of the number of dielectric layers

[+] Author Affiliations
Winfried Arens, Detlev Ristau

Laser Zentrum Hannover e.V. (Germany)

Jens Ullmann, Christoph Zaczek

Carl Zeiss (Germany)

Roland Thielsch, Norbert Kaiser, Angela Duparre

Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)

Oliver Apel, Klaus R. Mann

Laser-Lab. Goettingen e.V. (Germany)

Hans Lauth, Helmut Bernitzki

JENOPTIK Laser, Optik, Systeme (Germany)

Johanes Ebert

Laseroptik GmbH (Germany)

Stefan Schippel, H. Heyer

Layertec GmbH (Germany)

Proc. SPIE 3902, Laser-Induced Damage in Optical Materials: 1999, 250 (March 3, 2000); doi:10.1117/12.379314
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From Conference Volume 3902

  • Laser-Induced Damage in Optical Materials: 1999
  • Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau
  • Boulder, CO | October 04, 1999

abstract

The key technologies for modern production processes with enhanced spatial resolution, require high performance DUV- excimer laser optics with enhanced optical properties. Major challenges imposed onto the requested new generation of optical elements are concentrated on lowest absorption and scattering as well as stability against highest pulse number throughput. These targets are the driving force within the German Joint Research Project 'OPUS II', which is dedicated to the development of high quality optical components for the DUV spectral range. As a major contribution to these investigations, sets of reflecting stacks with four different numbers of layer pairs of LaF3/MgF2 were produced by 6 partners of the consortium and characterized in respect to their optical performance and structural properties. The characterization includes spectrophotometric measurements from the VUV up tot eh mid RI range. calorimetric absorption measurements at 193 nm, and a comparative study in total scatter behavior at 193 nm, which was performed by three laboratories within the project. Also, besides the intrinsic stress and the surface topography of the layers, the non-linear absorption behavior of selected samples have been determined. The results are presented and discussed with respect to possible applications.

© (2000) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Winfried Arens ; Detlev Ristau ; Jens Ullmann ; Christoph Zaczek ; Roland Thielsch, et al.
"Properties of fluoride DUV excimer laser optics: influence of the number of dielectric layers", Proc. SPIE 3902, Laser-Induced Damage in Optical Materials: 1999, 250 (March 3, 2000); doi:10.1117/12.379314; http://dx.doi.org/10.1117/12.379314


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