Variable angle spectroscopic ellipsometry in the vacuum ultraviolet

John A. Woollam; James N. Hilfiker; Thomas E. Tiwald; Corey L. Bungay; Ron A. Synowicki; Duane E. Meyer; Craig M. Herzinger; Galen L. Pfeiffer; Gerald T. Cooney; Steven E. Green

doi:10.1117/12.405820

2 November 2000 Variable angle spectroscopic ellipsometry in the vacuum ultraviolet

John A. Woollam, James N. Hilfiker, Thomas E. Tiwald, Corey L. Bungay, Ron A. Synowicki, Duane E. Meyer, Craig M. Herzinger, Galen L. Pfeiffer, Gerald T. Cooney, Steven E. Green

Author Affiliations +

Proceedings Volume 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries; (2000) https://doi.org/10.1117/12.405820
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

Optical properties of thin films and bulk materials at short wavelengths, including 157 nm and shorter, are needed for development of new lithographic processes, new fundamental science, and new metrology in the semiconductor, optical and data storage industries. Variable angle spectroscopic ellipsometry offers non-destructive and precise measurement of thin film thickness and refractive index in the wavelength range from 140 nm to 1700 nm (0.73 eV to 8.9 eV). The addition of short wavelengths allows analysis of multilayer dielectric stacks, often difficult to do using visible spectroscopy alone. Another major application is in study of wide bandgap materials such as SiC and GaN related compound semiconductors for blue lasers and detectors. This paper reviews the present status of spectroscopic ellipsometry applications in the vacuum ultraviolet.

Citation Download Citation

John A. Woollam, James N. Hilfiker, Thomas E. Tiwald, Corey L. Bungay, Ron A. Synowicki, Duane E. Meyer, Craig M. Herzinger, Galen L. Pfeiffer, Gerald T. Cooney, and Steven E. Green "Variable angle spectroscopic ellipsometry in the vacuum ultraviolet", Proc. SPIE 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, (2 November 2000); https://doi.org/10.1117/12.405820

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