0

Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Spectrophotometric determination of absorption in the DUV/VUV spectral range for MgF2 and LaF3 thin films

[+] Author Affiliations
Stefan Guenster, Detlev Ristau

Laser Zentrum Hannover e.V. (Germany)

Salvador Bosch

Univ. de Barcelona (Spain)

Proc. SPIE 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, 299 (November 2, 2000); doi:10.1117/12.405830
Text Size: A A A
From Conference Volume 4099

  • Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
  • Ghanim A. Al-Jumaily; Angela Duparre; Bhanwar Singh
  • San Diego, CA | July 30, 2000

abstract

The intrinsic absorption of fluoride coating materials tends to higher values in the DUV/VUV spectral range. In respect to applications of this material class for DUV/VUV multilayer systems, like high reflecting mirrors and anti- reflective coatings, the control of absorption is essential for further improvement of the coating quality. However, the reliable determination of absorption losses by photometric techniques has to overcome various obstacles caused by light absorption in air, scattering effects of the coating, and absorption related to contamination of the employed fluoride material. In this contribution spectrophotometric measurements for the characterization of optical data of MgF2 and LaF3 single layers and multi layer systems are presented. An advanced VUV/DUV-spectrophotometer, which has been developed at the Laser Zentrum Hannover for the optimization of thin film production processes, is described. The subsequent optical data evaluation for fluoride single layer coatings is reported and the optical data, n and k, of MgF2 and LaF3 for the spectral range from 130 to 660 nm are presented. Transmittance and reflectance measurements of multilayer coating systems are compared to theoretical calculations for these systems on the basis of the evaluated optical data of the single layers. Observed deviations are discussed under respect of contaminations of the fluoride layer systems.

© (2000) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Stefan Guenster ; Detlev Ristau and Salvador Bosch
"Spectrophotometric determination of absorption in the DUV/VUV spectral range for MgF2 and LaF3 thin films", Proc. SPIE 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, 299 (November 2, 2000); doi:10.1117/12.405830; http://dx.doi.org/10.1117/12.405830


Access This Article
Sign In to Access Full Content
Please Wait... Processing your request... Please Wait.
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
 

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement


Buy this article ($18 for members, $25 for non-members).
Sign In