Excimer lamp stereolithography

Saburoh Satoh; Takao Tanaka; Satoshi Ihara; Chobei Yamabe

doi:10.1117/12.387563

7 June 2000 Excimer lamp stereolithography

Saburoh Satoh, Takao Tanaka, Satoshi Ihara, Chobei Yamabe

Proceedings Volume 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V; (2000) https://doi.org/10.1117/12.387563
Event: Symposium on High-Power Lasers and Applications, 2000, San Jose, CA, United States

Abstract

For the laser stereo-lithography, a XeCl excimer lamp with cylindrical tube has been adopted to achieve a lower cost type UV light source. Because of excellent high output efficiency, it is possible to be down sizing of a power supplier and a lamp head and to be air-cooling. And moreover to extract the maximum output power and efficiency, we applied an optical fiber system for its lithography optics. With this excimer lamp the maximum UV emission per pulse 25 (mu) J at 100 Hz and the maximum average power 10 mW at 1000 Hz were obtained.

Citation Download Citation

Saburoh Satoh, Takao Tanaka, Satoshi Ihara, and Chobei Yamabe "Excimer lamp stereolithography", Proc. SPIE 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V, (7 June 2000); https://doi.org/10.1117/12.387563

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