Paper
8 November 2000 Present status of the ASET at-wavelength phase-shifting point diffraction interferometer
Author Affiliations +
Abstract
The precise alignment of Extreme Ultra-Violet Lithography (EUVL) imaging system is necessary in order to achieve diffraction-limited performance. Interferometric testing at the exposure wavelength is needed to ensure proper alignment and to achieve an acceptable final wavefront. We have built a prototype at-wavelength interferometer at the NewSUBARU facility. This interferometer is a phase-shifting point diffraction interferometer (PS/PDI) testing specially constructed Schwarzschild optics. Preliminary experiments using visible light were performed in order to learn this PS/PDI. The Schwarzschild optics were aligned using visible wavefront measurements with the interferometer. The precision of the visible measurements was evaluated. Experiments using EUV radiation have been started.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Katsumi Sugisaki, Yucong Zhu, Yoshio Gomei, Masahito Niibe, Takeo Watanabe, and Hiroo Kinoshita "Present status of the ASET at-wavelength phase-shifting point diffraction interferometer", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); https://doi.org/10.1117/12.406675
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Visible radiation

Extreme ultraviolet

Mirrors

Wavefronts

Information technology

Interferometers

Interferometry

Back to Top