Optical proximity effect of a next-generation superresolution technique

Kazuya Kamon

doi:10.1117/12.275993

7 July 1997 Optical proximity effect of a next-generation superresolution technique

Kazuya Kamon

Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.275993
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

A new super resolution technique with wide applicability and high resolution enhancement has been developed. Various optical properties of the new optics have been analyzed by some optical simulations. Using a spontaneously optimized source shape for the mask pattern itself leads to better applicability with the new optics. From experimental verification, the DOF of the new optics is 1.5 times wider than the modified illumination. An alignment accuracy of 0.1 micrometers (on mask) is acceptable between the first and second mask. According to simulation results, the optical proximity effect is reduced by the new optics. These features offer significant merits to photolithography technology. Therefore, we estimate the optical proximity effect by optical image measurements and simulations. From the simulation result, we can use the third source aperture to control the optical proximity effects. For conventional illumination, a 0.35 micrometers L/S image is formed by two beam interference. For the new optics, the same pattern is imaged by four beam interference because the UV light is diffracted twice by the mask pattern. While the optical proximity correction system was being developed, it was confirmed that the pattern size fluctuation is sufficiently smaller for four or more beam interference. The experimental results of an x-z image profile for 0.35 micrometers , 0.4 micrometers or 0.5 micrometers line and any space are consistent with simulation results.

Citation Download Citation

Kazuya Kamon "Optical proximity effect of a next-generation superresolution technique", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.275993

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
11 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Super resolution

Optical simulations

Optical alignment

Optical lithography

Optical properties

Optical proximity correction

Optical testing

Show All Keywords

Keywords/Phrases

Search In:

Publication Years