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Proceedings Article

Three-dimensional nonplanar lithography simulation using a periodic fast multipole method

[+] Author Affiliations
Michael S. Yeung, Eytan Barouch

Boston Univ. (USA)

Proc. SPIE 3051, Optical Microlithography X, 509 (July 7, 1997); doi:10.1117/12.276030
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From Conference Volume 3051

  • Optical Microlithography X
  • Gene E. Fuller
  • Santa Clara, CA, USA | March 10, 1997

abstract

This paper discusses an extension of the fast multipole method to electromagnetic scattering from doubly periodic, multilayer wafer topography. The novelty of our approach lies in the use of a pseudo-periodic translation operator which can be computed efficiently using fast Fourier transform. Results obtained using the rigorous boundary conditions for dielectric surfaces are compared with those obtained using the approximate impedance boundary condition. The latter is shown to give good results for the type of topography usually encountered in lithography simulation. Results of reflective-notching simulation using the IBC method are presented.

© (1997) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Michael S. Yeung and Eytan Barouch
"Three-dimensional nonplanar lithography simulation using a periodic fast multipole method", Proc. SPIE 3051, Optical Microlithography X, 509 (July 7, 1997); doi:10.1117/12.276030; http://dx.doi.org/10.1117/12.276030


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