Paper
22 August 2000 Micromirror arrays for wavefront correction
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Proceedings Volume 4178, MOEMS and Miniaturized Systems; (2000) https://doi.org/10.1117/12.396506
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States
Abstract
For wavefront correction in adaptive optics mirror devices are required, which provide a pure phase shift capability with a fine partition over the optical cross section. For this purpose we investigated arrays of piston-type micromirrors. In order to predetermine the basic deformation characteristics and to estimate appropriate design parameters a simple analytical model was derived. We then designed and fabricated arrays of different mirror elements on top of passive address devices by means of surface-micromachining realizing pixel side lengths of 75, 100, 120 and 150 micrometers . Experimental investigations of the electromechanical behavior were done by surface profile measurements using white light interferometry, which reveals a good overall functionality of the mirror arrays. Furthermore, an analog deflection range of up to 1.2 micrometers at address voltages below 32V were obtained together with a load dependent height level accuracy of 80 to 100 nm.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andreas Gehner, Michael Wildenhain, and Hubert K. Lakner "Micromirror arrays for wavefront correction", Proc. SPIE 4178, MOEMS and Miniaturized Systems, (22 August 2000); https://doi.org/10.1117/12.396506
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Cited by 6 scholarly publications.
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KEYWORDS
Mirrors

Adaptive optics

Analog electronics

Micromirrors

Wavefronts

Electrodes

Phase shifts

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