High-precision mask fabrication for deep-x-ray lithography

Andreas Schmidt; Gerhard Himmelsbach; Regina Luettge; Dieter Adam; Falk Hoke; Hartmut Schacke; Nikola Belic; Hans Hartmann; Frank Burkhard; Hermann Wolf

doi:10.1117/12.377113

3 February 2000 High-precision mask fabrication for deep-x-ray lithography

Andreas Schmidt, Gerhard Himmelsbach, Regina Luettge, Dieter Adam, Falk Hoke, Hartmut Schacke, Nikola Belic, Hans Hartmann, Frank Burkhard, Hermann Wolf

Author Affiliations +

Proceedings Volume 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2000) https://doi.org/10.1117/12.377113
Event: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 1999, Munich, Germany

Abstract

Deep X-ray lithography with synchrotron radiation represents the primary process step of the LIGA technique, by means of which high volume production of micro-mechanical, micro- optical and micro-fluidic components becomes possible. We report on a new approach where the direct patterning of an intermediate mask has been performed by an upgraded Leica ZBA23 shaped beam electron writer with an acceleration voltage of 40 kV. Optimized development and exposure processes as well as the use of particularly performed proximity correction methods allowed to product feature sizes down to 0.4 micrometers . Taking CD-values of the final gold absorber structure as a target, an optimized parameter set has been found to manufacture periodic lines-and-spaces structures of 1.5 micrometers width with an accuracy of 0.18 micrometers per edge which were written into 2 micrometers thick PMMA resist.

Citation Download Citation

Andreas Schmidt, Gerhard Himmelsbach, Regina Luettge, Dieter Adam, Falk Hoke, Hartmut Schacke, Nikola Belic, Hans Hartmann, Frank Burkhard, and Hermann Wolf "High-precision mask fabrication for deep-x-ray lithography", Proc. SPIE 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (3 February 2000); https://doi.org/10.1117/12.377113

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available