Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

High-throughput NGL electron-beam direct-write lithography system

[+] Author Affiliations
N. William Parker, Alan D. Brodie, John H. McCoy

Ion Diagnostics, Inc. (USA)

Proc. SPIE 3997, Emerging Lithographic Technologies IV, 713 (July 21, 2000); doi:10.1117/12.390042
Text Size: A A A
From Conference Volume 3997

  • Emerging Lithographic Technologies IV
  • Elizabeth A. Dobisz
  • Santa Clara, CA | February 27, 2000

abstract

Electron beam lithography systems have historically had low throughput. The only practical solution to this limitation is an approach using many beams writing simultaneously. For single-column multi-beam systems, including projection optics (SCALPELR and PREVAIL) and blanked aperture arrays, throughput and resolution are limited by space-charge effects. Multibeam micro-column (one beam per column) systems are limited by the need for low voltage operation, electrical connection density and fabrication complexities. In this paper, we discuss a new multi-beam concept employing multiple columns each with multiple beams to generate a very large total number of parallel writing beams. This overcomes the limitations of space-charge interactions and low voltage operation. We also discuss a rationale leading to the optimum number of columns and beams per column. Using this approach we show how production throughputs >= 60 wafers per hour can be achieved at CDs <EQ 100 nm, independent of both wafer diameter and die size. The Cost-of-Ownership (CoO) advantages of direct-write (maskless) lithography are significant especially for small-volume semiconductor fabrication, for example ASICs, SOCs and MPUs.

© (2000) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

N. William Parker ; Alan D. Brodie and John H. McCoy
"High-throughput NGL electron-beam direct-write lithography system", Proc. SPIE 3997, Emerging Lithographic Technologies IV, 713 (July 21, 2000); doi:10.1117/12.390042; http://dx.doi.org/10.1117/12.390042


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement


  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.