193-nm photoresist development at Union Chemical Labs., ITRI

Mao-Ching Fang; Jui-Fa Chang; Ming-Chia Tai; Tzu-Yu Lin; Ting-Chung Liu; Chien-Hung Liu

doi:10.1117/12.388378

23 June 2000 193-nm photoresist development at Union Chemical Labs., ITRI

Mao-Ching Fang, Jui-Fa Chang, Ming-Chia Tai, Tzu-Yu Lin, Ting-Chung Liu, Chien-Hung Liu

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388378
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Union Chemical Laboratories has designed and synthesized novel copolymers of norbornene-alt-derivatives, maleic anhydride and alicyclic acrylate for ArF excimer laser lithography. These polymers are prepared using a free-radical copolymerization process. Applying the resin for 193-nm single layer chemically amplified photoresist composed of cholate derivative with a PAG leads to a good resolution below 0.13 micrometer line/space patterns using an ArF stepper and 2.38 wt% tetramethylammonium hydroxide aqueous solution as a developer. Furthermore, alternating phase shift mask was used in combination with a feature size as small as 0.1 micrometer. To overcome post exposure delay (PED) effect caused by airborne contamination, three new base additives were used in the resist formulation. The etching-resist ability of resists by reaction ion etching (RIE) was showed better than conventional g-line and KrF excimer laser resists. Experimental results of CHF₃/CF₄ as etch gas, indicate that the etching rate selectivity with respect to SiO₂ is about 0.5. The UCL photoresists also showed good shelf life stability.

Citation Download Citation

Mao-Ching Fang, Jui-Fa Chang, Ming-Chia Tai, Tzu-Yu Lin, Ting-Chung Liu, and Chien-Hung Liu "193-nm photoresist development at Union Chemical Labs., ITRI", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388378

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available