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Proceedings Article

Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters

[+] Author Affiliations
Zhong G. Ling, Kun Lian

Louisiana State Univ. (USA)

Linke Jian

Xian Jiaotong Univ. (Germany)

Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, 1019 (June 23, 2000); doi:10.1117/12.388266
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From Conference Volume 3999

  • Advances in Resist Technology and Processing XVII
  • Francis M. Houlihan
  • Santa Clara, CA | February 27, 2000

abstract

SU-8 has great potential in low cost ultra-thick high aspect ratio MEMS applications. Although a broad range of thickness (from micrometer to mm) can be obtained by spin coating, the works about the sidewall profile and dimension control of SU-8 microstructures have not been published in detail. This paper describes the detailed investigations on the effects of processing parameters such as UV wavelength and exposure dose on dimensional change and sidewall profile of SU-8 microstructures. The optimized processing parameters for SU-8 structures with the thickness from 10 to 360 micrometer are presented.

© (2000) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Zhong G. Ling ; Kun Lian and Linke Jian
"Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, 1019 (June 23, 2000); doi:10.1117/12.388266; http://dx.doi.org/10.1117/12.388266


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