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Proceedings Article

Characterization of thin metal films with overlayers by transparency and multiangle including surface plasmon excitation reflectance ellipsometry method

[+] Author Affiliations
Olga Y. Borkovskaya, Nikolas L. Dmitruk, Oksana V. Fursenko

Institute for Physics of Semiconductors (Ukraine)

Proc. SPIE 3094, Polarimetry and Ellipsometry, 250 (April 1, 1997); doi:10.1117/12.271822
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From Conference Volume 3094

  • Polarimetry and Ellipsometry
  • Maksymilian Pluta; Tomasz R. Wolinski
  • Kazimierz Dolny, Poland | May 20, 1996

abstract

The complex method of optical characterization of thin metal films with overlayers consisting of three types of measurements has ben developed and testified. It based on both transparency measurements and multi-angle reflectance ellipsometry including the surface plasmons excitation regime. The computation of layers thicknesses and their optical constants by the solution of the inverse ellipsometric problem using the modified method of general search and special choice of fitting function has been carried out. The method was used for Au and Ag layers evaporated on GaAs, InP or quartz substrates.

© (1997) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Olga Y. Borkovskaya ; Nikolas L. Dmitruk and Oksana V. Fursenko
"Characterization of thin metal films with overlayers by transparency and multiangle including surface plasmon excitation reflectance ellipsometry method", Proc. SPIE 3094, Polarimetry and Ellipsometry, 250 (April 1, 1997); doi:10.1117/12.271822; http://dx.doi.org/10.1117/12.271822


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