Beamline for metrology of x-ray/EUV optics at the Advanced Light Source

James H. Underwood; Eric M. Gullikson; Masato Koike; Phillip J. Batson

doi:10.1117/12.278850

11 July 1997 Beamline for metrology of x-ray/EUV optics at the Advanced Light Source

James H. Underwood, Eric M. Gullikson, Masato Koike, Phillip J. Batson

Proceedings Volume 3113, Grazing Incidence and Multilayer X-Ray Optical Systems; (1997) https://doi.org/10.1117/12.278850
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

We describe a bending magnet beamline for the characterization of optical elements (mirrors, gratings, multilayers, detectors, etc.) in the energy range 50 - 1000 eV. Although it was designed primarily for precision reflectometry of multilayer reflecting optics for EUV projection lithography, it has capabilities for a wide range of measurements. The optics consist of a monochromator, a reflectometer, a 3-mirror order suppressor, and focusing mirrors to provide a small spot on the sample. The monochromator is a very compact entrance slitless, varied line spacing plane grating design in which the mechanically ruled grating operates in the converging light from a spherical mirror working at high demagnification. Aberrations of the mirror are corrected by the line spacing variation, so that the spectral resolving power (lambda) /(Delta) (lambda) is limited by the ALS source size to about 7000. Wavelength is scanned by simple rotation of the grating with a fixed exit slit. The reflectometer has the capability of positioning the sample to 10 micrometer and setting its angular position to 0.002 degrees. LABVIEW^TM based software provides a convenient interface to the user. The reflectometer is separated from the beamline by a differential pump, and can be pumped down in 1/2 hour. Auxiliary experimental stations can be mounted behind the reflectometer. Results are shown which demonstrate the performance and operational convenience of the beamline.

Citation Download Citation

James H. Underwood, Eric M. Gullikson, Masato Koike, and Phillip J. Batson "Beamline for metrology of x-ray/EUV optics at the Advanced Light Source", Proc. SPIE 3113, Grazing Incidence and Multilayer X-Ray Optical Systems, (11 July 1997); https://doi.org/10.1117/12.278850

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