Paper
1 October 1997 Metal island films near the surface of optical coatings: deposition experiments and plasmon-absorption line adjustment of metal nanoclusters in organic and inorganic optical thin films
Olaf Stenzel, Alexander Stendal, Michael Roeder, Andrei Lebedev, Axel Franke, Christian von Borczyskowski
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Abstract
We present experiments on the optical properties of ultrathin (a few nanometers thick) films (copperphthalocyanine, amorphous silicon) with an incorporated metal cluster film (silver, indium). Due to the spatially close interface, the plasmon absorption may be displaced from its resonance frequency in the bulk, and its average position may be controlled by the average thickness of the ultrathin optical film. For example, we observe a shift of the plasmon resonance of silver clusters in amorphous silicon films (on quartz glass) from 440 nm to 740 nm, when the silicon thickness increases from `zero' up to 15 nm. The deposition experiments are accompanied by investigation of the film structure, particularly in order to estimate the silver cluster diameter, which is around 3 nm or less. Additionally, numerical simulations are in progress to optimize the island film preparation conditions.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Olaf Stenzel, Alexander Stendal, Michael Roeder, Andrei Lebedev, Axel Franke, and Christian von Borczyskowski "Metal island films near the surface of optical coatings: deposition experiments and plasmon-absorption line adjustment of metal nanoclusters in organic and inorganic optical thin films", Proc. SPIE 3133, Optical Thin Films V: New Developments, (1 October 1997); https://doi.org/10.1117/12.279115
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KEYWORDS
Metals

Amorphous silicon

Plasmons

Silver

Absorption

Interfaces

Silicon films

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