Compact electrostatic lithography column for nanoscale exposure

Tom Chisholm; Haoning Liu; Eric Munro; John A. Rouse; Xieqing Zhu

doi:10.1117/12.287810

25 September 1997 Compact electrostatic lithography column for nanoscale exposure

Tom Chisholm, Haoning Liu, Eric Munro, John A. Rouse, Xieqing Zhu

Proceedings Volume 3155, Charged Particle Optics III; (1997) https://doi.org/10.1117/12.287810
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

This paper describes an all-electrostatic electron-beam column which uses conventional electrode assemblies, resulting in a system which is very much smaller than a magnetic lens column. Computer modeling of the electron-optical performance of the column has shown that the concept has promise as a lithography tool. Beam broadening due to electron-electron interactions and aberrations of the final accelerating lens are both small enough to give a resolution which matches that of present-day magnetic columns.

Citation Download Citation

Tom Chisholm, Haoning Liu, Eric Munro, John A. Rouse, and Xieqing Zhu "Compact electrostatic lithography column for nanoscale exposure", Proc. SPIE 3155, Charged Particle Optics III, (25 September 1997); https://doi.org/10.1117/12.287810

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available