Software tool for temperature simulation in electron-beam lithography: TEMPTATION

Sergey V. Babin; Igor Yu. Kuzmin; G. Sergeev

doi:10.1117/12.301219

12 February 1997 Software tool for temperature simulation in electron-beam lithography: TEMPTATION

Sergey V. Babin, Igor Yu. Kuzmin, G. Sergeev

Proceedings Volume 3236, 17th Annual BACUS Symposium on Photomask Technology and Management; (1997) https://doi.org/10.1117/12.301219
Event: 17th Annual BACUS Photomask Technology and Management, 1997, Redwood City, CA, United States

Abstract

Resist heating becomes a problem when using high-throughput electron-beam lithography (EBL). The TEMPTATION software tool was developed to simulate temperature change during electron- beam exposure. The software uses an original resist heating model that measures heat transfer through a multilayer resist and substrate. It has analytical formulas to provide fast numerical simulation of large patterns and a user-friendly Windows95 interface. The software is useful in the design of EBL systems and the development of new EBL processes.

Citation Download Citation

Sergey V. Babin, Igor Yu. Kuzmin, and G. Sergeev "Software tool for temperature simulation in electron-beam lithography: TEMPTATION", Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); https://doi.org/10.1117/12.301219

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