Computer simulations of scatter from various surface features are very important for addressing the design issues associated with producing scanners to meet evolving industry needs. This paper deals with mathematical modeling of light scattering by small pits of arbitrary shape on the surface of silicon wafers. The code based on method of moments applied to the volume integral equation, has been developed, and the numerically modeled differential scattering cross- section is presented for various types of pits. Pit shape and orientation are investigated.© (1998) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.