Current pattern data formats for electron beam lithography are specifically designed to meet the needs of the
VLSI industry. As a result, pattern data file size is often the limiting factor in the production of a binary computer
generated hologram and not the spatial bandwidth product. This paper explores one alternate pattern data
format that facilitates the full utilization of the e-beam machine's spatial bandwidth product without introducing
prohibitive amounts of pattern data. The pattern data format uses two well established data compression techniques
specifically tailored to remove the redundancies present in holographic fringe patterns.© (1990) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.