Diffraction efficiency of binary optical elements

J. Allen Cox; Thomas R. Werner; James C. Lee; Scott A. Nelson; Bernard S. Fritz; James W. Bergstrom

doi:10.1117/12.17953

1 May 1990 Diffraction efficiency of binary optical elements

J. Allen Cox, Thomas R. Werner, James C. Lee, Scott A. Nelson, Bernard S. Fritz, James W. Bergstrom

Proceedings Volume 1211, Computer and Optically Formed Holographic Optics; (1990) https://doi.org/10.1117/12.17953
Event: OE/LASE '90, 1990, Los Angeles, CA, United States

Abstract

We examine the role of processing errors on diffraction efficiency of binary optical elements and the validity of the Fourier model to predict diffraction efficiency. We show that mask alignment error can significantly degrade efficiency. Models based on the Fourier theory can adequately predict both the magnitude of diffraction efficiency and its sensitivity to processing errors for optically slow elements (f/b). For optically fast elements (

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J. Allen Cox, Thomas R. Werner, James C. Lee, Scott A. Nelson, Bernard S. Fritz, and James W. Bergstrom "Diffraction efficiency of binary optical elements", Proc. SPIE 1211, Computer and Optically Formed Holographic Optics, (1 May 1990); https://doi.org/10.1117/12.17953

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