Scattering and coherence in EUVL

Tomas D. Milster; Neil A. Beaudry

doi:10.1117/12.309613

5 June 1998 Scattering and coherence in EUVL

Tomas D. Milster, Neil A. Beaudry

Proceedings Volume 3331, Emerging Lithographic Technologies II; (1998) https://doi.org/10.1117/12.309613
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

We illustrate the importance of considering scattering from the illuminator in extreme UV lithography systems. Our results indicate that a significant amount of amplitude modulation noise is present in the aerial image if scatter is present in a Koehler illuminator. The effect depends on the spatial frequency of the pattern on the mask, the numerical aperture of the projection camera, the coherence factor, and placement of the plane in the illuminator where the scattering occurs.

Citation Download Citation

Tomas D. Milster and Neil A. Beaudry "Scattering and coherence in EUVL", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309613

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