Amplified spontaneous emission simulation of copper bromide vapor laser

Naohiko Goto; Koshichi Nemoto

doi:10.1117/12.176675

25 May 1994 Amplified spontaneous emission simulation of copper-bromide vapor laser

Naohiko Goto, Koshichi Nemoto

Proceedings Volume 2118, Gas, Metal Vapor, and Free-Electron Lasers and Applications; (1994) https://doi.org/10.1117/12.176675
Event: OE/LASE '94, 1994, Los Angeles, CA, United States

Abstract

The excited copper vapor distribution within the discharge tube was determined by simulating ASE intensity distribution--obtained with the copper bromide vapor laser equipment--using ASE intensity distribution simulation code. Upper and lower level population of copper vapor were assumed to have a uniform distribution along the tube axis and a Gaussian distribution along the tube radius in this simulation code. The simulation has revealed that distributions concentrate to the center of discharging and the difference of populations between the upper and lower levels little depend on reservoir temperature.

Citation Download Citation

Naohiko Goto and Koshichi Nemoto "Amplified spontaneous emission simulation of copper-bromide vapor laser", Proc. SPIE 2118, Gas, Metal Vapor, and Free-Electron Lasers and Applications, (25 May 1994); https://doi.org/10.1117/12.176675

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