Improved method for measuring low-level linear birefringence in optical materials

Baoliang Bob Wang

doi:10.1117/12.323758

23 September 1998 Improved method for measuring low-level linear birefringence in optical materials

Baoliang Bob Wang

Proceedings Volume 3424, Inorganic Optical Materials; (1998) https://doi.org/10.1117/12.323758
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

The authors reports in this paper a sensitive method for measuring low-level linear birefringence in optical materials. A photoelastic modulator is employed as the polarization modulation device in the set-up. The sensitivity of this method is evaluated to be at approximately 0.003 nm (approximately 0.002 degree(s) at 632.8 nm) by measuring the mechanically induced linear birefringence in a fused silica optical element. The capability of this method is demonstrated by determining the residual linear birefringence below 0.1 nm in several high quality optical elements.

Citation Download Citation

Baoliang Bob Wang "Improved method for measuring low-level linear birefringence in optical materials", Proc. SPIE 3424, Inorganic Optical Materials, (23 September 1998); https://doi.org/10.1117/12.323758

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