Fabrication of blazed gratings and grisms utilizing anisotropic etching of silicon

Tatsuo Harada; Hideo Sakuma; Masaru Fuse

doi:10.1117/12.323415

24 September 1998 Fabrication of blazed gratings and grisms utilizing anisotropic etching of silicon

Tatsuo Harada, Hideo Sakuma, Masaru Fuse

Proceedings Volume 3450, Theory and Practice of Surface-Relief Diffraction Gratings: Synchrotron and Other Applications; (1998) https://doi.org/10.1117/12.323415
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

The fabrication process of blazed diffraction gratings and grisms utilizing anisotropic etching of single crystal silicon is described. Grating patterns are formed either holographically or mechanically on the resist film coated onto the dioxide surface of the silicon substrate. Triangularly shaped grating grooves are formed by etching the substrate using KOH based solvent. The grooves are with the specific orientation of the single crystal so that accurate and ultra-smooth groove facets can be obtained especially for infrared gratings and shallow groove grisms.

Citation Download Citation

Tatsuo Harada, Hideo Sakuma, and Masaru Fuse "Fabrication of blazed gratings and grisms utilizing anisotropic etching of silicon", Proc. SPIE 3450, Theory and Practice of Surface-Relief Diffraction Gratings: Synchrotron and Other Applications, (24 September 1998); https://doi.org/10.1117/12.323415

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